Papers by Keyword: Plasma Immersion

Abstract: Ammonia implanted silicon was performed by using plasma immersion ion implantation (PIII) to form a silicon nitride films. Blood compatibility of the prepared samples was investigated by platelets adhesion testing. It showed less activation i.e. lower thrombosis risks occurs on the prepared silicon nitride films than control silicon sample. The enhanced blood compatibility of the material is attributed to the modified surface properties such as hydrophilicity from thermodynamic adsorption perspective, which is related to surface chemical bonding states achieved by PIII process.

Abstract: Vacuum arc plasma can be formed using particularly uncomplicated hardware, providing a means for laboratory scale formation of dense and highly-ionized metal plasma. The simplicity and versatility of the approach has led to its widespread use in recent times for both fundamental and technological applications. When embodied in a plasma gun configuration, the source can provide a valuable tool for plasma deposition of metal and metal-containing thin films, including in plasma immersion configurations. When embodied in an ion source configuration, high current beams of metal ions can be formed, and such beams have found good use for ion implantation and particle accelerator injection. Here we briefly review vacuum arc plasma guns and ion sources, outlining some of the hardware embodiments that have been developed at Berkeley and used for various materials modification applications.