Papers by Keyword: Printed Electronic

Abstract: The purpose of this paper is to study a ink surface morphology, quantify the chemical composition involved in processing of graphite ink printed by flexographic printing. The methodology is to use surface sensitive technique, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). As a finding we successfully achieved 25 micron lines array using PDMS printing plate. The Originality and value of this work is surface sensitive techniques like XPS, AFM and FESEM were exclusively used in order to characterize graphite inks printed by flexographic method, using PDMS printing plate.

Abstract: The fundamental aspects of the wettability and the elasticity of soft matters, particularly, functional polymer solutions, lipid membranes, and biological cells in the development of new technologies are overviewed from the basic principles and underlying physics. The key concept is how to control interfacial interactions between solid substrates and soft matters through surface modification. Two representative examples are demonstrated to discuss the underlying physics behind the pattern and domain formation; one of them is multi-dimensional generation of heterogeneous organic arrays and the other is micro-patterning of red blood cells on lipid membranes

Abstract: The gate, source, and drain electrodes of organic thin-film transistor(OTFT) to use as a switching device for a flexible display was fabricated in microcontact printing process with hard poly(dimethylsiloxane)(h-PDMS) stamp. The OTFT with thin-film dielectric layer of parylene-C(4300Å, 5000Å, 6500Å, 7500Å, and 9000Å) were formed using special coating system, and organic semiconductor layer was ink-jet printing process at room temperature. The microcontact printing process using self-assembled monolayer(SAM) and h-PDMS stamp made it possible to fabricate OTFT with channel length down to 600nm, fabricated thin film electrode of Au/Cr (100nm/5nm), and reduced the fabrication process by 20steps compared with photolithography process. Since the fabrication process was done in room temperature, there was no appeared such as pattern shrinkage, pattern transformation and bending problem.