Papers by Keyword: Resist Pattern

Abstract: Resist pattern was developed on a cathode for EPD and a polytetrafluoroethylene (PTFE) film was set on the cathode. Then EPD was performed with a suspension of hydroxyapatite (HA) nuclei in ethanol. In this process, HA nuclei were deposited on a porous PTFE film so as to transcribe the resist pattern. The substrate was soaked in simulated body fluid (SBF) and HA was selectively induced on HA nuclei. As a result, HA pattern whose resolution was as high as the resist pattern was fabficated.

Abstract: Apatite micropattern was fabricated by a combination of biomimetic process and transcription of resist pattern. We optimized some fabrication conditions such as the height of resist pattern, temperature, concentrations and pH of simulated body fluid(SBF). Consequently, we successfully obtained apatite micropattern widely and homogeneously on a substrate in a short fabrication period.

Abstract: Apatite pattern was prepared by electrophoretic deposition (EPD) transcribing resist pattern. A porous polytetrafluoroethylene (PTFE) film was used as a substrate and attached on a cathode. The cathode for EPD was stainless plate with resist pattern. EPD was performed with a suspension of wollastonite particles in acetone and wollastonite particles were deposited on the substrate in the form of the resist pattern. When the wollastonite-deposited substrate was soaked in simulated body fluid (SBF), apatite was induced and then replaced wollastonite at the wollastonite deposited region on the substrate. As a result, apatite was formed in the pattern that traced the resist pattern. The minimum line width of the apatite pattern was about 100 µm.