Authors: Bo Feng, A. Liu, N. Wu, Jie Weng, Shu Xin Qu, Jian Xin Wang, Xiong Lu
Abstract: Bone-like hydroxyapatite (HA) coatings were fabricated on titanium implants by a
self-assembled technique and biomimetic method. After titanium plates were oxidized in a mixture of
H2SO4/H2O2, a hexadecanoic acid self-assembled onto titanium surfaces. Contact angles of water and
tricresyl phosphate on the surfaces were measured to characterize the self-assembled monolayer
(SAM) and confirm the presence of the functional group. The titanium plates with SAM were used to
fabricate HA coatings. In the simulate body fluid (SBF) with and without bovine serum albumin
(BSA), Ca2+ and PO4
3- ions could spontaneously deposit onto the titanium surfaces and form
bone-like HA coatings. The morphology, component and structure of samples were examined by
scanning electronic microscopy, X-ray photoelectron spectroscopy, X-ray diffraction and attenuated
total reflection Fourier transform infrared spectroscopy. The results suggested that the SAM can
induce the formation of the nano-HA coating with a network and microporous structure. For the
biomimetical HA coating induced by HDA-SAM, BSA could modulate the growth of HA crystal and
decreased the grain size.
1529
Authors: Jeong Gil Lee, Hee Jung Park, Jae Gab Lee
Abstract: We have investigated selective deposition of Co thin films on the OTS-patterned glass
surface by using μ-CP(Micro-Contact Printing) coupled with MOCVD(Metal Organic Chemical
Vapor Deposition) method with Co2(CO)8 as a Co precursor. Co thin films in the thickness of 5-180
nm has been selectively formed on the glass surface in the presence of the OTS(Octadecyltrichlrosilane)
monolayer at the temperatures 60-90, at the pressure of 0.03-0.6 Torr. The self-assembled
OTS monolayer on the surface passivates the surface hydroxyl(-OH), adsorption sites for Co
precursors, and thus significantly increases the induction period to nucleate Co metals on the OTS
monolayer, compared with on the bare glass. Lowering the temperature and the processing pressure is
likely to increase the difference in the induction period for the two substrate surfaces and thus
improves the selectivity. About 180 nm-thick Co thin film was selectively formed on the
OTS-patterned glass at 70, however, lowering the temperature to 60 decreased the thickness,
which is attributed to the reduced growth rate of Co at the lower temperature. The Co thin films
deposited at 60-90 and at 0.03-0.6 Torr have the resistivities of 10-20 μ4-cm and are free of
contamination. Consequently, the low temperature process for the selective deposition of Co in the
presence of the OTS monolayer can be utilized for a variety of applications including flexible
electronics and semiconductor devices.
531
Authors: Moon Hee Lee, Sung Kyoung Kim, Hee Young Choi, Ha Jin Lee, Sun Young Koo, Hai Won Lee
491
Authors: Valentina Ivanova, Mila Manolova, Dieter M. Kolb
Abstract: A novel technique has recently been presented for depositing metal layers onto a SAM.
This is demonstrated here for Pd and Pt deposits on a mercaptopyridine (4-PyS) SAM. The SAMcovered
Au(111) electrode is immersed into the metal-ion-containing solution without potential
control. As a result, metal ions, e.g., Pd(II) (respectively Pt(II)) adsorb on the surface by forming a
complex with the pyridine species. Subsequently, the electrode is transferred to a metal-ion-free
solution, where the adsorbed metal ions are reduced electrochemically to its zero-valent state. Upon
reduction, monoatomic high metal islands were observed in STM. Angle resolved XPS
measurements show unequivocally that the reduced metal resides on top of the SAM.
363
Abstract: A novel photochemical approach is presented to fabricate a silicon oxide (SiOx) layer, which we
have named an “oxide nanoskin” (ONS), whose thickness is defined in the molecular-order of 1~3
nm. Through the chemisorption of a vapor phase organosilane and subsequent photooxidation
using 172 nm vacuum ultraviolet (UV) light, an extremely flat SiOx layer without cracks or
aggregates was formed on various polymer substrates. Owing to this ONS coating, the charge
density and surface acidity of the polymer substrates became almost equal to those of a native
oxide-covered Si (SiOx/Si) substrate. In addition, there was marked improvement in the durability
of the hydrophilicity and in the micro-wear resistance of the polymer surfaces. Moreover,
organosilane self-assembled monolayer (SAM) chemistry currently available for the treatment of
inorganic glass and Si substrates could be similarly utilized. Well-ordered SAMs with a wide
variety of terminal-end groups (e.g., trifluorocarbon or amino groups) could be fabricated even on
inert polymer substrates, in a manner similar to their fabrication on SiOx/Si substrates. Furthermore,
we demonstrated the site-selective deposition of metal oxide and metal films on polymer substrates
using photolithographically micropatterned SAMs as microtemplates. Well-shaped microstructures
were achieved only on the polymer substrates with the ONS layer. On the substrates without the
ONS layer, pattern resolution degraded significantly and growth rate decreased, since both
depended greatly on the SAM density and quality. Our ONS was very useful not only in forming
highly ordered SAMs on the polymer substrates, but also in obtaining excellent pattern resolution,
sufficient growth rate, and adhesion of the target materials.
660
Authors: J. Gustavsson, G. Altankov, A. Errachid, Josep Samitier, Josep A. Planell, Elisabeth Engel
Abstract: As a ceramic, silicon nitride (Si3N4) has been suggested as a biocompatible material in
contact with bone. In another configuration, as a low pressure chemically vapor deposited
(LPCVD) thin film, Si3N4 can also be used as the sensitive material in certain biosensor
applications. With the latter in mind, the biocompatibility of such films was investigated after them
being modified with silane based self-assembled monolayers (SAMs) bearing functional end groups
of methyl (CH3), primary amine (NH2), and carboxyl (COOH) respectively. The SAM surface
modifications provided a wide range of physiochemical properties including hydrophobic (CH3),
hydrophilic (bare Si3N4), positively (NH2) and negatively charged (COOH). Specifically the cell
adhesion and proliferation, as well as the levels of alkaline phosphatase activity and osteocalcin,
have been evaluated using the human osteoblast-like MG-63 cell line. It was observed that
attachment and spreading was pronounced on NH2 while suppressed on CH3. With time the cells
grew to confluence on all chemistries, and the levels of osteocalcin normalized to total protein
content varied as CH3 > Si3N4 > COOH > NH2, but without significant differences. The highest
spontaneous alkaline phosphatase activity was observed from cells grown on Si3N4 substrata.
122
Authors: George K. Toworfe, R.J. Composto, Christopher S. Adams, I.M. Shapiro, Paul Ducheyne
275
Authors: Tomohiko Inomata, Kenji Matsumoto, Yasuhiro Funahashi, Tomohiro Ozawa, Hideki Masuda
Abstract: The hydroxamate-based artificial siderophore that contains terminated-amine group was
newly synthesized. This artificial siderophore formed stable complex with FeIII ion and high
bio-activities. The FeIII-artificial siderophore complex was attached onto the glass substrate surface by
stepwise self-assembling method. The obtained artificial siderophore-modified glass substrate
adsorbed the Gram-positive bacterium Microbacterium. flavescens. The Gram-negative bacterium
Escherichia. coli was not adsorbed. The artificial siderophore-modified glass substrates indicated the
selective adsorption of microorganisms.
251
Authors: In Hee Choi, Young Hun Kim, Chang Mook Kim, Jin Soo Kim, Kyung Hee Choi, Jong Heop Yi
Abstract: Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (Vo). Terminal group (-CH3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication
903
Authors: R.C. Hoffmann, Joachim Bill, Fritz Aldinger
331