Papers by Keyword: Titania Films

Abstract: A graded titania film was formed on chemically polished NiTi shape memory alloy (SMA) by a novel deposition-assisted advanced oxidation method in a modified Fenton’s reagent containing titanium tetrachloride and then characterized by SEM and XPS. The effects of the titania film on leaching of harmful Ni ions from the NiTi substrate in simulated body fluids (SBF) is assessed by inductively-coupled plasma mass spectrometry (ICPMS). The results indicate that a thick and dense titania film was successfully fabricated in this in situ advanced oxidation reaction assisted with an additional deposition process by the hydrolysis of titanium tetrachloride on NiTi. The titania film can dramatically reduces Ni leaching from NiTi. XPS depth profiles show that the film possesses a smooth graded interfacial structure that boost mechanical stability.

Abstract: The surface oxide films were prepared by Electron Cyclotron Resonance (ECR) plasma oxidation on Ti substrates. Octacalcium phosphate (OCP) and dicalcium phosphate dihydrate (DCPD) peaks were formed after calcification by supersaturated calcium and phosphate solutions. Calcification ability was enhanced with increasing the oxidation time and the total pressure of ECR plasma treatment during oxidation. The results demonstrated that the calcium phosphate nucleation and the deposition can be controlled by various ECR plasma conditions.

Abstract: Titania films were coated by means of sol-gel method on various substrates such as titanium, titanium alloy, silicon wafer, stainless-steel, alumina, and glass slide where they coded as C5Ti, C5Ti6Al4V, C5Si, C5SUS, C5Al2O3 and C5GS, respectively. Their in vitro apatite-forming ability was examined with the Kokubo’s simulated body fluid (SBF; pH 7.4, 36.5°C). C5Ti, C5Ti6Al4V and C5Si deposited apatite particles on their surface within 7 days, whereas, C5SUS, C5Al2O3 and C5GS did not. These results implied that the in vitro apatite-forming ability of the titania films indirectly depended on the chemical or physical properties of the substrates.

Abstract: Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.