Papers by Keyword: Titanium Nitride TiN

Abstract: hBN-TiN Binary Composite Was Fabricated Using Spark Plasma Sintering (SPS) at Temperatures between 1973 and 2273 K. With Increasing TiN Content from 10 to 90 Vol%, the Relative Density Increased from 75.7 to 96.4%. The Maximum Relative Density of 96.4% Was Achieved in the hBN-TiN Containing 90 Vol%TiN Sintered at 2273 K. hBN and TiN Was Stably Coexisted at 1973 K without TiB₂ Formation.

Abstract: The commercially pure(CP) titanium specimens were modified with Direct current(DC) plasma nitriding and arc ion plating of TiN film. The duplex treated titanium samples were characterized by scanning electron microscopy(SEM), microhardness tester and ball-on-disc tribotester. The results showed that the duplex treated CP titanium appeared uniform and bright golden, microhardness and wear resistance improved substantially and were superior to that of only TiN coated ones. All these results indicate plasma nitriding and TiN film deposition duplex treatment can improve surface characteristics of CP titanium significantly. The method can be applied to the titanium denture to improve the tribological properties and color.

Abstract: Titanium nitride (TiN) film has been widely used as a diffusion barrier layer for VLSI contact metallization because TiN is an excellent barrier against inter-diffusion between Al and Si substrate or silicide. In this work, we studied the properties of TiN films deposited by DC magnetron sputtering with varying N2:Ar flow rate ratio in order to optimize growth conditions and film properties provided for Al diffusion barrier purpose. The TiN films were deposited at the constant pressure level and sputtering time. The crystalline orientation, composition and electrical properties of deposited TiN films were characterized by XRD, AES-depth profile and Four Point Probe measurement, respectively. The XRD results show that the deposited TiN film has two preferred orientations of TiN(111) and TiN(200) planes. The highest intensity of the TiN(111) plane was obtained when the N2:Ar flow rate ratio was 3:1. The electrical resistivity was increased when the N2:Ar flow rate ratio was decreased. The minimum electrical resistivity is 127.8 μΩ-cm when the N2:Ar flow rate ratio is 3:1.

Abstract: Internal stresses are very important for the performance of protective hard coatings. Tensile stresses favour the formation and propagation of cracks, inducing fracture and corrosion. Medium compressive stresses hinder fatigue. But high compressive stresses, typically for hard coatings produced by PVD (physical vapour deposition) processes, support delamination in order to relax the stored elastic energy. However notwithstanding its relevance, the internal stresses are only seldom used for the optimisation and quality control of hard coatings in industry. This unsatisfying situation is caused by the deficit in efficient measuring methods. The results of thin sheets, where the stresses can be simply measured by their curvature, are not necessarily representative for the coating of thicker parts. The conventional XRD (X-ray Diffraction), based on angle-dispersive evaluation needs expensive devices and is rather time consuming. The energy-dispersive technique opens new possibilities. It is based on polychromatic radiation. The interference of the lattice plane reflections corresponding to the Bragg-equation is investigated by the diffraction intensity of the different wavelength (or photon energies), not by varying the Bragg-angle as in conventional XRD. Hence, the whole diffraction pattern can be obtained in one shoot without the use of any goniometer. This allows the construction of small and compact measuring devices and the reduction of measuring time to a few minutes. The capability of the ED-XRD (Energy Dispersive X-ray Diffraction) is demonstrated for titanium nitride and chromium nitride films deposited by cathodic vacuum arc with varying parameters. Comparisons were made with the much more time-consuming AD-XRD (Angle Dispersive X-ray Diffraction) for residual stress analysis. The results of both methods are in good agreement.

Abstract: Fully dense ZrO2-TiN composites containing 1.75-2 mol %Y2O3, 1 mol% Y2O3 and 1 mol% Nd2O3 stabilizers, small amounts of Al2O3, and electrical conductive TiN particles (40-70 vol%) have been produced by hot pressing and spark plasma sintering at 1550°C. Although the intrinsic hardness of TiN (1400 kg/mm²) is higher than that of t-ZrO2 (1200 kg/mm²), the decreasing hardness trend can be attributed to the larger TiN grain size with the higher TiN content. Since TiN is more brittle, the fracture toughness decreases with increasing TiN content. Transformation toughening has been attributed as the main toughening mechanism as a result of fracture toughness decreasing with the transformability. Spark Plasma sintering temperature was too high for mechanical properties and hydrothermal stability of the mixed stabilized composites. The transformability decreases so hydrothermal stability increases linearly with increasing TiN content as a result of smaller volume fraction of t-ZrO2 grains becoming susceptible to hydrothermal transformation due to the shielding effect of the present TiN grains.

Abstract: The Ti-Hf alloy system forms α-β isomorphous system and does not form any intermetallic compounds, which is also beneficial for good mechanical properties. And in order to avoid the release of materials, surface modifications are generally carried out to form a TiN and ZrN layer on the surface. Electrochemical properties of TiN and ZrN coated Ti-Hf alloy by RFsputtering has been researched using various electrochemical methods. Ti-10wt%, 20wt%, 30wt%, and 40wt% Hf alloys manufactured by non consumable vacuum arc melting furnace. All the specimens were heat treatment at 1000°C for 24hr in Ar atmosphere followed by furnace cooling, respectively. The specimens were coated with TiN and ZrN respectively, by RF-magnetron sputtering method. The microstructures were conducted by using OM, EDX and SEM. The corrosion tests were carried out using potentiodynamic(PARSTAT 2273, EG&G, USA) and potentiostatic test in 0.9% NaCl solution at 36.5 ±1 °C. Microstructure clearly observed that lamellar structure translated to needle-like structure with increased Hf contents. From the analysis of TiN and ZrN coated layer analysis, TiN and ZrN coated surface showed columlar structure with 600nm and 100nm thickness, respectively. The corrosion resistance of TiN and ZrN coated Ti alloys were higher than those of the non-coated Ti-alloy in 0.9%NaCl solution, indicating better protective effect.

Abstract: (Ti, Al) N coating had been deposited by Arc Ion Plating, in an atmosphere of nitrogen. The structure of the coatings was examined as a function of deposition conditions by X-ray diffraction, and the crystallographic orientation was determined by use of a texture coefficient. The coatings on ground titanium substrates developed a strong (111) orientation from the earliest stages of growth, although the degree of orientation was dependent on deposition conditions. TiAlN coatings, however, showed relatively multiple orientations mainly of (111) and (200). Furthermore, TiAlN films demonstrated superior corrosion resistance in a molten aluminum alloy at 680°C. This paper described in detail the corrosion and mass loss phenomena related to this steel-cast metal interaction.

Abstract: Four point bending fatigue tests were carried out using martensitic stainless steel with TiN film deposited at five different deposition rates by dynamic ion mixing process in order to investigate the influence of deposition rate on the fatigue strength. As a result, the fatigue limit clearly increased by the deposition at appropriate conditions. However, the deposition by other conditions resulted in the degradation of fatigue strength. This is caused by the decrease of threshold stress intensity factor after TiN deposition and the difference of defect distribution in the film. In addition, the crack propagation rate was increased in low stress intensity factor range by the deposition of TiN film.

Abstract: High quality TiN/Ti multi-layers have been successfully obtained on a carbon steel substrate by double glow plasma surface alloying technique (DGP). The TiN/Ti multi-layers consists of deposition layer and diffusion layer, and then on its surface TiN film (PVD) is deposited to form TiN/TiN/Ti compound multi-layers. In addition, studies were carried to compare TiN/Ti multi-layers, TiN/TiN/Ti compound multi-layers and TiN film (PVD) directly deposited on the surface of the carbon steel and their microhardness and dry friction-abrasion properties were also investigated. The results show that the thickness of TiN/Ti multi-permeated layers is above 10*m; Ti and N concentrations change gradually along the depth of alloying layer. TiN/Ti multi-layers and substrates are metallurgically bonded. Preferred orientation of TiN/Ti multi-layers is crystal surface (200). The hardness of the TiN/Ti multi-permeated layers ranges up 2200HV, its average friction coefficient is lower, abrasion crack is shallower and wear resistance better.

Abstract: 1.75 mol % Y2O3-stabilized ZrO2-based composites with 35-95 vol % TiN were fully densified by hot pressing for 1 hour at 1550°C under a load of 28 MPa. The TiN grain size was found to increase with increasing TiN content, resulting in a decreasing hardness and strength. The best mechanical properties, i.e., an indentation toughness of 5.9 MPa.m1/2 in combination with a Vickers hardness of 14.7 GPa and an excellent bending strength of 1674 MPa were obtained for the composites with 40 vol % TiN. The active toughening mechanisms were identified and their contribution to the overall composite toughness is discussed. Transformation toughening was found to be the primary toughening mechanism in all investigated composites.