Paper Titles
Reviewers
Ecomaterials in the Global Eco-Society: Present Situation and Future Prospects
p.1
Optical Properties of InAs/AlAs Self-Assembled Quantum Dots
p.9
A New Aspect in Computational Nanomaterial Science: Odd Electrons in Molecular Chemistry, Surface Science, and Solid State Magnetism
p.19
Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures
p.29
Ion Implantation Induced Modifications in Reactively Sputtered Cr-N Layers on Si Substrates
p.35
Design Considerations for Nonmagnetic Semiconductor-Based Spin Filters
p.41
Particle-In-Cell Modelling of a Neutral Beam Source for Material Processing in Nanoscale Structures Fabrication
p.47
Influence of Charging on SiO2 Etching Profile Evolution Etched by Fluorocarbon Plasmas
p.53

Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures

Article Preview

Abstract:

Polystyrene-polymethylmethacrylate (PS-PMMA) block copolymers are well known to exhibit microphase separation to form a series of regular structures with local periodic arrangements of the blocks. By developing films of PS-PMMA within topographically patterned silicon (100) substrates (with photolithographically defined rectangular channels of depth 60 nm and widths 166 – 433 nm) these irregular arrangements form highly periodic structures where the features are parallel to the side walls of the channels. However, the use of silicon substrates leads to problems in processing of these films. PS-PMMA does not wet the surface, and this results in island formation on flat substrates. On channel etched substrates this phenomena ensures that the thickness of the films is irregular and poorly defined alignment is seen. Detailed considerations of this polymer system suggest that feature sizes below 25 nm are not realisable. The results suggest other copolymer systems should be studied.

You might also be interested in these eBooks
Research Trends in Contemporary Materials Science View Preview

Info:

Periodical:

Materials Science Forum (Volume 555)

Pages:

29-34

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.555.29

Citation:

Cite this paper

Online since:

September 2007

Authors:

F. Borsetto, B. Kosmala, T.G. Fitzgerald, Matthew T. Shaw, J. Patterson, P. Rapposelli, J.M. O´Callaghan, J.D. Holmes, Michael A. Morris

Keywords:

Block-Copolymer, Microphase Separation, Nanopattern, Photolithography, Template

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2007 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

References

[1] ITRS road map 2005: Y. Xia and G.M. Whitesides: Angew. Chem. Int. Edit. Vol. 37 (1998), p.550.

Google Scholar

[2] Y. Chen and A. Pepin: Electrophoresis Vol. 22 (2001), p.187.

Google Scholar

[3] See for example: C. Park, J. Yoon and E.L. Thomas: Polymer Vol. 44 (2003), p.6725.

Google Scholar

[4] Y. Huang and C.M. Lieber: Pure Appl. Chem. Vol. 76 (2004), p.2051 and refs. therein.

Google Scholar

[5] K.J. Ziegler, B. Polyakov, J.S. Kulkarni, T.A. Crowley, K.M. Ryan, M.A. Morris, D. Erts and J.D. Holmes: J. Mat. Chem. Vol. 14 (2004), p.585.

Google Scholar

[6] D. Erts, B. Polyakov, B. Daly, M.A. Morris, S. Ellingboe, J. Boland and J.D. Holmes: J. Phys. Chem. B Vol. 110 (2006), p.820.

Google Scholar

[7] G. Krausch and R. Magerle: Adv. Mats. Vol. 14 (2002), p.1579; T. Liu, C. Burger and B. Chu: Prog. Polymer Sci. Vol. 28 (2003), p.5.

Google Scholar

[8] T. Thurn-Albrecht, J. Schotter, G.A. Kastle, N. Emley, T. Shibauchi, L. Krusin-Elbaum, K. Guarini, C.T. Black, M.T. Tuominen and T.P. Russell: Science Vol. 290 (2000), p.2126.

DOI: 10.1126/science.290.5499.2126

Google Scholar

[9] D. Sundrani, S.B. Darling and S.J. Sibener: Langmuir Vol. 20 (2004), p.5091.

Google Scholar

[10] C.T. Black: Applied Physics Letters Vol. 87 (2005), p.163116.

Google Scholar

[11] H-C Kim and T.P. Russell: J. of Poly. Sci. B: Poly. Phys. Vol. 39 (2001), p.663.

Google Scholar

[12] K.Y. Suh, Y.S. Kim and H.H. Lee: J. Chem. Phys. Vol. 108 (1998), p.1253.

Google Scholar

[13] M.W. Matsen and M. Schick: Phys. Rev. Lett. Vol. 72 (1994), p.2660.

Google Scholar

[14] E.W. Edwards, M.P. Stoykovich, H.H. Solak and P.F. Nealey: Macromolecules Vol. 39 (2006), p.3598 and references therein.

Google Scholar

[15] P.J. Cole, R.F. Cook and C.W. Macosko: Macromolecules Vol. 36 (2003), p.2808.

Google Scholar

[16] I.W. Hamley: Physics of Block Copolymers (Oxford University Press, Oxford 1998).

Google Scholar

[17] R.A. Segalaman: Mats. Sci. Eng. Vol. 48 (2005), p.191.

Google Scholar

[18] I.W. Hamley: Developments in Block Copolymer Science and Technology in Introduction to Block Copolymers, Ed. I.W. Hamley (John Wiley and Sons, Chichester 2004).

DOI: 10.1002/0470093943.ch1

Google Scholar

[19] Polymer handbook, Fourth edition, Eds. J. Brandrup, E.H. Immergut, E.A. Grulke (WileyInterscience, New York 1999).

Google Scholar

[20] L.A. Utracki: J. Poly. Sci. B Vol. 42 (2004), p.2909.

Google Scholar

[21] K.K. Chee: Malaysian J. Chem. Vol. 7 (2005), p.57.

Google Scholar

[22] T.A. Mykhaylyk, S. Collins, C. Jani and I.W. Hamley: Eur. Poly. Journal Vol. 40 (2004), p.1715.

Google Scholar

[23] T. Xu, H-C. Kim, J. De Rouchey, C. Seney, C. Levesque, P. Martin, C. M. Stafford and T. P. Russell: Polymer Vol. 42 (2001), p.9091.

Google Scholar