Electrical and Physical Characteristics of Ba(Zr<sub>0.1</sub>Ti<sub>0.9</sub>)O<sub>3</sub> Thin Films under Oxygen Plasma Treatment for Nonvolatile Memory Devices Application

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Electrical and Physical Characteristics of Ba(Zr_0.1Ti_0.9)O₃ Thin Films under Oxygen Plasma Treatment for Nonvolatile Memory Devices Application

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