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A Linear Phase Growth with Non-Equilibrium Vacancies
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HomeMaterials Science ForumMaterials Science Forum Vols. 155-156Silicides Thin Films Formed by Metal/Silicon...

Silicides Thin Films Formed by Metal/Silicon Reaction: Role of Diffusion

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Reactive Phase Formation at Interfaces and Diffusion Processes

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Periodical:

Materials Science Forum (Volumes 155-156)

Pages:

39-54

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.155-156.39

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Online since:

May 1994

Authors:

Patrick Gas

Keywords:

Grain Boundary Diffusion, Kinetics of Formation, M/Si Solid State Reaction, Self-Diffusion, Silicide, Thin Film

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© 1994 Trans Tech Publications Ltd. All Rights Reserved

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