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Reactive Phase Formation at Interfaces and Diffusion Processes

Materials Science Forum Volumes 155 - 156

• Papers
• Abstracts

• p1 Interface Reactions with Formation of a Solid Phase on a Solid Substrate: A Short Overview   [ 583 K ]
  Authors: François M. d'Heurle
• p15 Reactive Interdiffusion   [ 651 K ]
  Authors: Jean Philibert
• p31 Phase Stability during Growth of Compound Layers   [ 340 K ]
  Authors: V.I. Dybkov
• p39 Silicides Thin Films Formed by Metal/Silicon Reaction: Role of Diffusion   [ 762 K ]
  Authors: Patrick Gas
• p55 A Linear Phase Growth with Non-Equilibrium Vacancies   [ 137 K ]
  Authors: Andriy Gusak
• p59 Modellization of the Growth of Three Intermediate Phases   [ 357 K ]
  Authors: S.-L. Zhang, François M. d'Heurle
• p71 Spectroscopic Studies of Phase Formation and Diffusion Processes at Interfaces   [ 993 K ]
  Authors: K.D. Becker
• p91 Experimental Investigation of Reactive Phase Formation at Interfaces by Ion Beam Techniques   [ 711 K ]
  Authors: G. Blaise
• p111 TEM and In Situ HREM for Studying Metal-Semiconductor Interfacial Reactions   [ 697 K ]
  Authors: R. Sinclair, Toyohiko J. Konno, D. Hong Ko
• p121 Simulations of Growth   [ 418 K ]
  Authors: P. Stoltze
• p131 Ordering in Semiconductor Alloys   [ 992 K ]
  Authors: J.E. Bernard
• p149 Ab Initio Molecular Dynamics   [ 654 K ]
  Authors: K. Laasonen
• p165 Chemical and Topological Structure of Alloy Surfaces: From Equilibrium to Kinetics   [ 1 M ]
  Authors: B. Legrand, A. Saúl, G. Tréglia
• p189 Atomic Scale Simulations of Solute-Atom Segregation at Grain Boundaries in Binary FCC Alloys   [ 1 M ]
  Authors: D. Udler, David N. Seidman
• p209 Lattice Kinetic Descriptions for Bulk Reaction-Diffusion Processes: Application to Alloys under Irradiation   [ 1 M ]
  Authors: Pascal Bellon, G. Martin