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In-Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films

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Periodical:

Materials Science Forum (Volumes 455-456)

Pages:

342-345

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.342

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Online since:

May 2004

Authors:

Rui Miguel S. Martins, Rui Jorge C. Silva, Francisco Manuel Braz Fernandes, Luís Pereira, Paulo R. Gordo, Manuel J.P. Maneira, Norbert Schell

Keywords:

Metal Characterization, Nitinol, Shape Memory Alloy Actuator, Thin Film, X-Ray Diffraction (XRD)

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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References

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