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A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region

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Abstract:

The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.

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Periodical:

Materials Science Forum (Volumes 475-479)

Pages:

1223-1226

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.475-479.1223

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Online since:

January 2005

Authors:

Ming Zhao, Da Ming Zhuang, Gong Zhang, Ling Fang, Min Sheng Wu

Keywords:

Absorption in Visible Region, Mid-Frequency Alternative Reactive Magnetron Sputtering, Nitrogen Doping, TiO2 Film

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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