Authors: Alexandra Gonçalves, Gonçalo Gonçalves, Elvira Fortunato, António Marques, Ana Pimentel, Rodrigo Martins, Manuela A. Silva, Michael J. Smith, João Bela, João Paulo Borges
Abstract: Electrochromic materials have attracted considerable attention during the last two
decades as a consequence of their potential application in several different types of optical devices. Examples of these devices include intelligent windows and time labels. In this paper the authors describe results obtained with thin tungsten oxide films produced at room temperature by rf magnetron sputtering under an argon and oxygen atmosphere on transparent conductive oxide coated glass substrates. To protect the surface of the electrochromic film, prevent water absorption and obtain a good memory effect under open circuit voltages, a layer of Ta2O5 was deposited over the WO3 films. In this study, the effect of different electrolyte compositions on the open circuit memory of optical devices has been characterized. The best results were obtained for electrochromic devices with polymer gel p(TMC)3LiClO4 and p(TMC)8LiClO4 electrolytes. These prototype devices present an
overall transmittance of ~75% in their bleached state and after coloration 40.5 and 52.5% respectively. These devices also show memory effect and an optical density considered satisfactory for some electrochromic applications.
83
Authors: Pedro Barquinha, Elvira Fortunato, Alexandra Gonçalves, Ana Pimentel, António Marques, Luís Pereira, Rodrigo Martins
Abstract: The purpose of this work is to present in-depth electrical characterization on transparent TFTs, using zinc oxide produced at room temperature as the semiconductor material. Some of the studied aspects were the relation between the output conductance in the post-pinch-off regime and width-to-length ratios, the gate leakage current, the semiconductor/insulator interface traps density and its relation with threshold voltage. The main point of the analysis was focused on channel
mobility. Values extracted using different methodologies, like effective, saturation and average mobility, are presented and discussed regarding their significance and validity. The evolution of the different types of mobility with the applied gate voltage was investigated and the obtained results are somehow in disagreement with the typical behavior found on classical silicon based MOSFETs, which is mainly attributed to the completely different structures of the semiconductor materials
used in the two situations: while in MOSFETS we have monocrystalline silicon, our transparent TFTs use poly/nanocrystalline zinc oxide with grain sizes of about 10 nm.
68
Authors: Leandro Raniero, Alexandra Gonçalves, Ana Pimentel, Shibin Zhang, Isabel Ferreira, Paula M. Vilarinho, Elvira Fortunato, Rodrigo Martins
Abstract: In this work we studied the influence of the power density of hydrogen plasma on
electrical and optical properties (Hall mobility, free carrier concentration, sheet resistance, optical transmittance and a.c. impedance) of indium zinc oxide films, aiming to determine their chemical stability. This is an important factor for the optimization of amorphous/nanocrystalline p-i-n hydrogenated silicon (a/nc-Si:H) solar cells, since they should remain chemically highly stable during the p layer deposition. To perform this work the transparent conductive oxide was exposed
to hydrogen plasma at substrate temperature of 473 K, 87 Pa of pressure and 20 sccm of hydrogen flow. The results achieved show that IZO films were reduced for all plasma conditions used, which leads mainly to a decrease on films transmittance. For the lowest power density used in the first minute of plasma exposition the transmittance of the IZO films decreases about 29%.
63
Authors: Elvira Fortunato, Alexandra Gonçalves, António Marques, Ana Pimentel, Pedro Barquinha, Hugo Águas, Luís Pereira, Leandro Raniero, Gonçalo Gonçalves, Isabel Ferreira, Rodrigo Martins
Abstract: In this paper we report some of the recent advances in transparent thin film oxide
semiconductors, specifically zinc oxide (ZnO), produced by rf magnetron sputtering at room temperature with multifunctional properties. By controlling the deposition parameters it is possible to produce undoped material with electronic semiconductor properties or by doping it to get either n-type or p-type semiconductor behavior. In this work we refer our experience in producing n-type
doping ZnO as transparent electrode to be used in optoelectronic applications such as solar cells and position sensitive detectors while the undoped ZnO can be used as UV photodetector or ozone gas sensor or even as active layer of fully transparent thin film transistors.
3