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Articles by author: Burkhard Beckhoff

• A Novel Instrumentation for Contamination and Deposition Control on 300 mm Silicon Wafers Employing Synchrotron Radiation Based TXRF and EDXRF Analysis
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p89)
• Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p281)
• Complementary Metrology within a European Joint Laboratory
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p97)
• Highly Sensitive Detection of Inorganic Contamination
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p101)
• Preparation and Characterization of Self-Assembled Monolayers on Germanium Surfaces
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p169)
• Reference Samples for Ultra Trace Analysis of Organic Compounds on Substrate Surfaces
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p295)
• Reliable Quantification of Inorganic Contamination by TXRF
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p291)
• S-Passivation of the Ge Gate Stack Using (NH₄)₂S
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p23)
• TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p165)
• X-Ray Spectrometry for Wafer Contamination Analysis and Speciation as Well as for Reference-Free Nanolayer Characterization
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p277)