Papers by Author: Csaba Cserháti

Abstract: Interdiffusion in Zn/InSb system has been investigated under high (0.59×10⁶ G) and low (1 G) gravity conditions at 673, 593 and 573K, respectively. Samples annealed at 0.59×10⁶ G, 673K for 60 hours, indicated the formation of a periodic reaction layer structure. Since such structures can be formed in solid state reactions of ternary systems [, the effect of high gravitational field and high hydrostatic pressure (approximately 3kbar) in the formation of periodic patterns was investigated. Systematic investigations at ambient pressure and low gravitational field were carried out at 593 and 573 K in sandwich geometry. SEM and EDX analysis had shown that there are different phases between the initial components. Starting from the Zn side of the specimen there is a very thin single-phase with high (about 90%) In content. Next to it is a thin two-phase layer, containing mainly 50-50% InSb and some elongated Zn particles and then there is a thick phase with the composition of Zn₅In₂Sb₄ which is followed by a similar two-phase mixture (InSb+Zn) similar to the Zn side of the sample. Although the diffusion zone is not a well developed periodic structure, but every layer (clearly distinguishable form the others and was either a single-or multiphase layer) grows with the time.

Abstract: In a set of recent papers we have shown that the diffusion asymmetry in diffusion couples (the diffusion coefficient is orders of magnitude larger in one of the parent materials) leads to interesting phenomena: i) sharp interface remains sharp and shifts with non Fickian (anomalous) kinetics [1-5], ii) originally diffuse interface sharpens even in ideal (completely miscible) systems [6,7], iii) an initially existing thin AB phase in A/AB/B diffusion couple can be dissolved [8], iv) there exists a crossover thickness (typically between few nanometers and 1m) above which the interface shift turns back to the Fickian behaviour [9], v) the growth rate of a product of solid state reaction can be linear even if there is no any extra potential barrier present (which is the classical interpretation of the “interface reaction control” for linear kinetics) [10]. These latter results will be summarized and reformulated according to the usual expression for linear-parabolic law containing the interdiffusion coefficient, D, and interface transfer coefficient, K. Relation between the activation energies of D and K will be analyzed and compared with available experimental data.

Abstract: X-ray standing wave technique has been used to measure the kinetics of CoSi intermetallic phase growth in a-Si/Co/a-Si sandwich structure. The a-Si/Co/a-Si arrangement were placed into a waveguide structure formed by two Ta films. X-ray fluorescence and extended X-ray absorption fine structure analysis has been used in a combination with X-ray standing wave technique for depth profiling with sub-nanometer resolution of specimens annealed at 493K for different annealing time. The position and the thickness of the growing CoSi intermetallic phase have been monitored.

Abstract: Solid state reactions between amorpous Si and crystalline Co have been investigated by synchrotron radiation at Bessy (Berlin, Germany). The multilayered samples (with 10 periods of a-Si(15 nm)/Co(15 nm) layers) were produced by magnetron sputtering and isothermally heat treated at temperatures between 523 and 593 K. From the time evolution of the XRD spectra first the growth rate of the CoSi phase as well as the decay rate of the Co layer we determined (at 523 and 543 K). The kinetics were described by a power law; tk, and for the growth of CoSi k=0.65 while for the loss of the Co the k=0.77 was obtained, respectively. At higher temperatures (at 573 and 593 K) the formation and growth of the Co2Si layer, at the expense of the Co and already existing CoSi layers, was observed with exponents of about 1 for all the above kinetics. These results, together with the results of resistance kinetics measurements, in similar multilayered as well as bi-layered samples at similar temperatures, providing similar exponents will be presented. Possibility of the interface reaction control and/or the effect of the diffusion asymmetry (which was recently published for the interpretation of solid state reactions with non-parabolic kinetics on the nanoscale) will be discussed.

Abstract: Solid state reactions between amorphous Si and crystalline Co have been investigated by 4W electrical resistance and TEM. Multilayered (with 10 periods of 5nm a-Si/5nm Co and 10 nma- Si/10nm Co layers) as well as tri-layered samples (20nm a-Si/3nmCoSi/6nm Co) were produced by magnetron sputtering and isothermally heat treated at different temperatures between 473 and 523K. From the time evolution of the normalized resistance the kinetics of the process were determined by fitting a power law, tk, and k was between 0.8 and 1. Possibility of the interface reaction control and/or the effect of the diffusion asymmetry (which was recently published for the non-parabolic interface shifts on the nanoscale) will be discussed.