Papers by Author: H. Roussel

Abstract: AlN is considered as the most suitable substrate material for further development of high quality and high performance nitride-based micro- and opto-electronics. AlN ingots are often grown on SiC seeds. To solve the formation of cracks due to the difference in lattice parameters between seed and crystal we chose to “adapt” the lattice mismatch by a buffer layer of the (AlN)x(SiC)1-x solid solution. This paper gives some inputs on the growth of AlN and the solid solution by the sublimation technique, in terms of materials compatibility, hetero- and homo-epitaxial growth of AlN and on the preparation of crack-free solid solution single crystals.

Abstract: QuaSiC TM substrates can be obtained by transferring a single crystal SiC layer onto a poly SiC substrate using the Smart Cut TM technology. The structure evolution of metal bonding (W-Si silicide) layer has been investigated by Transmission Electron Microscopy and X-ray diffraction. Results indicate that the metal bonding film is made of W5Si3. The film is discontinuous and strained. Annealing releases stress at least partially.