Papers by Author: Horst P. Strunk

Abstract: Epitaxial group-III nitride films, although in single crystalline form, contain still a large number of threading dislocations. These set limits to performance and lifetime of devices, notably to high power structures like lasers. The strategy in material development was and will be (at least until lattice-matched substrates become available) to reduce the dislocation densities. The present contribution elaborates on possible dislocation origination mechanisms that determine the population of dislocations in the epitaxial layers. These mechanisms can be controlled to a certain degree by proper deposition procedures. The achieved dislocation populations then determine the processes that can reduce the dislocation densities during growth of the epitaxial layers. The mutual annihilation of threading dislocations is rather efficient although affected by the glide properties of the growing epitaxial crystal and the thermal stresses during the cooling down after growth.

Abstract: We present comprehensive cathodoluminescence measurements from thin amorphous a- SiC films doped with rare earths. The a-SiC films were prepared by rf magnetron sputtering using a high purity SiC wafer in high purity argon atmosphere (5N, pressure approx. 0.2 mbar). The rare earth doping (Tb, Dy and Eu concentrations were below 2%) was performed by placing respective rare earth metal pieces of appropriate size onto the Silicon Carbide wafer. The rare earth ion emissions cover the colors green (Tb), yellow (Dy) and red (Eu). The optical and related structural properties of the films are correlated by means of high resolution transmission electron microscopy in combination with cathodoluminescence measurements in a scanning electron microscope. In addition, the corresponding compositions are determined by energy-dispersive x-ray analysis. The cathodoluminescence spectra of the rare earth 3+ ions are recorded in the visible at 20°C in the asgrown condition and after annealing treatments in the temperature range from 300°C to 1050°C by steps of 150°C. The anneal-related changes in the cathodoluminescence emission spectra and in the microstructure of the films are addressed. The SiC films show amorphous structure almost independent of the annealing treatment. Optimal annealing temperature for emissions of Tb3+ doped a-SiC were derived to be 600°C whereas Dy3+ and Eu3+ emissions increase at least up to 1050°C.