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Articles by author: J. Bergmann

• A Method for Data Reduction and Optimal Experimental Design in XPD
  Published in: European Powder Diffraction (p107)
• Advanced Fundamental Parameters Model for Improved Profile Analysis
  Published in: Residual Stress ECRS 5 (p303)
• An Unconventional Pile-up Correction
  Published in: European Powder Diffraction (p279)
• Application of a New Rietveld Software for Quantitative Phase Analysis and Lattice Parameter Determination of AIN-SiC-Ceramics
  Published in: European Powder Diffraction 4 (p177)
• Fundamental Parameters Versus Learnt Profiles Using the Rietveld Program BGMN
  Published in: European Powder Diffraction EPDIC 7 (p30)
• Handling of Unusual Instrumental Profiles by the BGMN Rietveld Program
  Published in: European Powder Diffraction 6 (p192)
• Molecular Modelling Features in XPD Rietveld Refinement of Organic Structures
  Published in: European Powder Diffraction 6 (p34)
• Multicrystalline Silicon Thin Films: Laser Crystallization Conditions and Properties
  Published in: Polycrystalline Semiconductors V (p187)
• Polysilicon Thin-Film Transistors Based on Frequency Doubled cw-Nd: YVO₄ Laser Crystallized Silicon
  Published in: Polycrystalline Semiconductors VII (p55)
• Powder Diffraction Investigations on Molecular Crystals of the Ring System Cyclo-Tri (2,6-Pyridyl Formamidine)
  Published in: European Powder Diffraction 4 (p869)
• Quantitative Phase Analysis Using the Rietveld Method - Estimates of Possible Problems Based on Two Interlaboratory Comparisons
  Published in: European Powder Diffraction EPDIC 8 (p45)
• Rietveld Analysis of Disordered Layer Silicates
  Published in: European Powder Diffraction 5 (p300)
• Single-Crystalline Regions of Silicon-on-Glass for Thin-Film Transistors
  Published in: Polycrystalline Semiconductors VI (p337)