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Articles by author: Karine Kenis

• Aging Phenomena in the Removal of Nano-Particles from Si Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p155)
• Differential Interference Contrast Microscopy of Defects in As-Grown and Annealed Si Wafers
  Published in: Gettering and Defect Engineering in Semiconductor Technology VII (p387)
• Evaluation of Megasonic Cleaning for Sub-90nm Technologies
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p141)
• High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p39)
• Influences of Oxide Loss on Contamination Removal
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p177)
• Lattice Defects in High Quality As-Grown CZ Silicon, Studied with Ligth Scattering and Preferential Etching Techniques
  Published in: Defects in Semiconductors 18 (p1755)
• Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers
  Published in: Ultra Clean Processing of Silicon Surfaces V (p251)
• Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p161)
• Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p119)
• Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p27)
• Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p233)
• Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p93)
• Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p241)