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Articles by author: Kunio Shimada

• Dependency of Micro Particle Adhesion of Dispersive and Nondispersive Interactions Analyzed by Atomic Force Microscopy
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p191)
• Effects of Particles Blend Ratio on Surface Quality in Surface Polishing Using Magnetic Polishing Liquid (MPL)
  Published in: Advances in Abrasive Technology VIII (p337)
• Magnetism and Self-Assembled Structure Utilizing Micro- and Nano-Particles
  Published in: ISMANAM-2004 (p121)
• Microscopic Analysis of Particle Removal by Gas/Liquid Mixture High-Speed Flow
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p207)
• Quartz Wafer Machining Using MCF (Magnetic Compound Fluid) Polishing Liquid Frozen with Liquid Nitrogen
  Published in: Advances in Abrasive Technology XI (p187)
• Study of Three-Dimensional Polishing Using Magnetic Compound Fluid (MCF)
  Published in: Advances in Abrasive Technology XII (p288)
• The Detailed Performance of MCF Polishing Liquid in Nano-Precision Surface Treatment of Acrylic Resin
  Published in: Advances in Abrasive Technology XII (p331)
• Wafer Backside Cleaning by Twin-Fluid Flow Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p183)