Papers by Author: Masayuki Yoshida

Paper TitlePage

Controlling Process of P Diffusion in Si Based on the Pair Diffusion Model
Authors: Masayuki Yoshida, Masami Morooka, M. Takahashi, H. Tomokage
617
Surface Concentration Dependence of Diffusion Profile Shape for Phosphorus in Si
Authors: Y. Banno, T. Ichino, H. Uchida, Masaya Ichimura, Eisuke Arai, Masayuki Yoshida
275
Behaviour of Substitutional Gold in Silicon
Authors: Masayuki Yoshida, Masami Morooka, H. Tomokage
139
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