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Articles by author: Peter Verheyen

• Defect-Free Si Thinning by In Situ HCI Vapour Etching
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p199)
• Influence of the Highly-Doped Drain Implantation and the Window Size on Defect Creation in p⁺/n Si_1-XGe_x Source/Drain Junctions
  Published in: Gettering and Defect Engineering in Semiconductor Technology XII (p95)
• Low Temperature Pre-Epi Treatment: Critical Parameters to Control Interface Contamination
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p177)