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Articles by author: Rita Vos

• Influences of Oxide Loss on Contamination Removal
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p177)
• Non-Oxidizing Solvent-Based Strip of Ion Implanted Photoresist
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p97)
• Poly-Silicon Etch with Diluted Ammonia: Application to Replacement Gate Integration Scheme
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p207)
• Procedure to Evaluate Particle-Substrate Interaction during Immersion in Liquid
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p53)
• Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p161)
• Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p157)
• Rinsing and Drying Effects on Heterogeneous Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces V (p195)
• Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p93)
• Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p119)
• Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p27)
• Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p53)
• Stripping of Ion Implanted Photoresist by CO₂ Cryogenic Pre-Treatment Followed by Wet Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p289)
• Study of the Etching Mechanism of Heavily Doped Si in HF
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p41)
• Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes
  Published in: Ultra Clean Processing of Silicon Surfaces V (p263)
• Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p113)