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Papers by Author: T. Akane

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Heavily Arsenic Doping into Si by ArF Excimer Laser Irradiation Using Tertiarybutylarsine (tBAs)

Authors: Shigefusa F. Chichibu, T. Nii, T. Akane, S. Matsumoto

243

Characterization of Excimer Laser Annealing of Arsenic Implanted Silicon

Authors: T. Akane, S. Matsumoto, I. Mizushima

237