Papers by Author: Xiao Bo Hu

Abstract: This paper introduces the topology and working principle of modular multilevel converter, simplifying its equivalent circuit before obtaining virtual equipotential. On the ground of the theoretical model of equivalent circuit, MMC-HVDC could adapt the same control strategy as the traditional method. So, on the platform of PSCAD/EMTDC, an eleven level MMC Dual-infeed HVDC system is established and nearest level modulation is adopted as its control strategy to sort voltage sharing of the modules. Experimental results prove the validity of the proposed model.

Abstract: Graphene, as strict two-dimensional material, exhibits exceptionally good electronic properties. In this paper, graphene was prepared on SiC substrates at different temperature based on two types of pre-treated surface. The surface morphology was characterized by atomic force microscopy (AFM) and scanning electronic microscopy (SEM). The results on SiC surface pre-treatment showed that chemical mechanical polishing (CMP) was an effective surface treatment method for reproducible and controlled growth of graphene. Images of the Si-surface revealed that the thickness of graphitic layers increased with annealing temperature. Meanwhile, a mesh-like network of wrinkles tended to tent-like features with the increase of temperature. The residual stresses, average crystallite size and number of graphene layers were analyzed by Raman spectroscopy. Little shift of 2D-band indicated the presence of certain stresses. Results among four samples showed that graphene layers grown on MP C-surface substrates had the thickest layers，contained the smallest average crystallite size L_a and exhibited no stresses. While graphene layers grown on Si-surface under 1600°C built upon compressive stresses, exhibited largest L_a and least number of graphene layers, indicating perfect quality.

Abstract: Contactless resistivity mapping, scanning electron microscope (SEM) and confocal laser microscope have been used to study the relationship of the resistivity and the etching behavior of the semi-insulating 6H-SiC wafer. Evidence is presented that the morphologies of the etch pits vary significantly with the impurity concentrations. The V impurity strongly affects the etch rates of edge, screw and mixed dislocations. For the dislocation containing the Burgers vector component of <0001>, its vertical etch rate is enhanced distinctly. In contrast, the horizontal etch rate becomes larger for the dislocation containing the Burgers vector component of < >. The shape of the etch pits reflects the Fermi level of the semi-insulating wafer and the net shallow impurity concentration.

Abstract: 4H-SiC single crystal with a diameter of 1.5’’ has been grown by the seed sublimation method. Regions of mixed polytypes are assessed by high resolution X-ray diffractometry with the asymmetrical diffraction geometry. Multiple reflections are observed from the rocking curve measurements of a longitudinal cut 4H-SiC slice. Those reflections are indexed to be 2131 and 2131 of 4H-SiC, 2130 , 2131 , 2131 , 2132 and 2132 of 6H-SiC, 2131 , 2132 , 2134 , 2135 and 2137 of 15R-SiC respectively based on the lattice constants of different polytypes in SiC crystal. It is believed that the polytypes can be identified by high resolution X-ray diffractometry.

Abstract: 6H-SiC ingots were grown with different growth interfaces at different rates via the sublimation method. A model for the step flow growth mechanism is proposed to interpret the occurrence of 15R-SiC inclusions in the 6H-SiC single crystal. The results show that the 15R-SiC occurs more easily on the convex and the concave interface than on the slight convex interface and 15R-SiC inclusion also occurs when the growth rate of 6H-SiC exceeds the critical rate of 300 %m/h with the slight convex interface at the seed temperature 2250°C.