Papers by Keyword: Metal-Dielectric Interface

Abstract: We investigated an influence of interface layer on a tunability of parallel plate (Ba, Sr)TiO3 thin film capacitors. BST thin film capacitors with top electrode of Pt, Au and Ag were fabricated. BST films had thickness of 40, 60, 80 and 120nm. The tunability increased with increasing the BST film thickness. Considering the interfaces between BST films and electrodes as Schottky junctions, depletion layers were formed in the interfaces depending on the difference of the work function of metal electrodes. Larger external bias voltages were applied to the depletion layer than interior BST film, because the permittivity in the depletion layer was smaller than that in interior BST film. Therefore, the depletion layer lowered the tunability. Tunability decreased with increasing the thickness of the depletion layers.

Abstract: The isothermal charging current and the isothermal discharging current in low mobility materials are analyzed either in terms of polarization mechanisms or in terms of charge injection/extraction at the metal-dielectric interface and the conduction current through the dielectric material. We propose to measure the open-circuit isothermal charging and discharging currents just to overpass the difficulties related to the analysis of the conduction mechanisms in dielectric materials. We demonstrate that besides a polarization current there is a current related to charge injection or extraction at the metal-dielectric interface and a reverse current related to the charge trapped into the shallow superficial or near superficial states of the dielectric and which can move at the interface in the opposite way that occurring during injection. Two important parameters can be determined (i) the highest value of the relaxation time for the polarization mechanisms which are involved into the transient current and (ii) the height of the potential barrier W0 at the metal-dielectric interface. The experimental data demonstrate that there is no threshold field for electron injection/extraction at a metal-dielectric interface.