Papers by Keyword: Plasma Density

Abstract: This paper presents an investigation of argon capacitively coupled plasma at low pressure. A two-dimensional, time-dependent fluid model is used to describe the production, transport, and destruction of electrons and positive ions. The model is solved for a GEC(gaseous electronics conference) Cell reactor type (with 4cm diameter and 2.5cm interelectrode distance) operating at frequency 13.56MHz, pressure 1Torr and applied voltage 1000V, in pure argon. Two-dimensional distributions are presented in the stationary state, including electron temperature and species density i.e. electron, ion and metastable atom. The electric field and electric potential at different phases in one RF cycle is also studied.

Abstract: Low temperature radio frequency plasma is widely used in low temperature plasma processing medium for material processing in many fields including microelectronics, aerospace, and the biology. For proper utilization of the process, it is very much important to know the plasma parameters. In this paper a novel technique is used to determine the plasma parameters from the electrical discharge characteristic and the power balance method. The homogeneous discharge model is used to evaluate the relation between the plasma parameters with the discharge characteristics. The electron density and temperature is found to be well agree with the Langmuir probe data in the range of 0.5x1016 to 45x1016 cm-3 and 1.4 to 1.6 ev for wide range of rf power.