Papers by Keyword: Polytype Transformation

Abstract: We achieved the growth of extremely-high quality SiC crystal with two-step solution method with specially-designed seed crystals. The two-step growth consists of 1^st step growth on Si-face for the reduction of threading dislocations and 2^nd step growth on C-face for the reduction of basal plane dislocations and thickening. In this method, we can make the dislocation density extremely low, while the polytype easily changes during growth due to the absence of spiral hillocks originating from threading screw dislocation (TSD). In this study, we prepared specially designed seed crystals for both 1^st and 2^nd growth steps to provide steps continuously. In the seeds, a few TSDs exist at the upper-side of the step structure. Consequently, we demonstrated the suppression of the polytype transformation during the C-face growth with extremely low-dislocation-density crystal. Accordingly, we successfully obtained extremely low-dislocation density 4H-SiC with TSD, TED and BPD density of 11, 385 and 28 cm^-2.

Abstract: In order to achieve a high-quality SiC crystal in solution growth, one of the most difficult issues is to grow a thick layer on Si face avoiding polytype transformation. In this case, two-dimensional nucleation, which leads to the polytype transformation, is frequently induced because a density of threading screw dislocations acting as a source of spiral step decreases and wide terraces form by step bunching as growth proceeds. Therefore, it is very difficult to stabilize the polytype of crystals grown with extremely low density of threading screw dislocations. In this study, we tried to overcome these problems by using specially designed seed crystal and optimizing growth temperature and temperature distribution. We successfully grew thick low-threading-dislocation density SiC crystal without polytype transformation under the condition of high growth temperature and homogeneous temperature distribution.

Abstract: SiC crystal ingots were grown on 6H-SiC dual-seed crystal with different surface properties by a PVT (Physical Vapor Transport) technique. And then SiC crystal wafers sliced from the SiC ingots were systematically investigated in order to find out the dependence of surface properties for seed on the polytype formation. While n-type SiC crystals exhibiting the 4H polytype were grown on seed crystal having high root-mean-square (rms) value, 6H-SiC crystals were grown on seed having lower rms value. However, 6H polytype was maintained on on-axis and off-axis seeds during the entire growth period. The crystal quality of 6H-SiC single crystals grown on on-axis seed were revealed to be slightly better than that of 6H-SiC crystal grown on off-axis seed.

Abstract: Reduction of threading screw dislocation without polytype transformation from 4H-SiC was performed by the combination of step-flow growth and spiral growth. On a vicinal 4H-SiC seed crystal, threading screw dislocations are converted to Frank-type stacking faults by step-flow during solution growth. As the growth proceeds, the defects are excluded to the crystal. Thus utilizing the conversion, high quality SiC crystal growth without threading screw dislocations is expected to achieve. However, at the same time, polytype transformation is caused by the occurrence of 2D nucleation. By using the special shape of seed crystal, we successfully grew high quality 4H-SiC crystal without threading screw dislocation and polytype transformation.

Abstract: In this work results of nitrogen doping in the amount of 0 vol.%, 3 vol.% and 10 vol.% on the growth of the 4H polytype on the 6H-SiC seed are presented. SiC crystals grown by PVT method on the (000-1) C-face of 6H seeds using the open seed backside design have been investigated. Structural and electrical properties of the crystals were studied by different experimental methods.

Abstract: 6H-SiC hetero-epitaxially grown on a (111) 3C-SiC was observed with TEM. High-density stacking faults were formed around the hetero-interface, and the density of stacking faults decreased with increasing distance from interface. On the other hand, when 3C-SiC was homo-epitaxially grown on a 3C-SiC, any stacking faults did not exist at the interface between the grown crystal and the seed crystal. Thus, the stacking faults formation started from the 6H/3C hetero-interface. Considering the lattice-mismatch strain between 3C-SiC and 6H-SiC, the strain energy is equivalent to the stacking fault energy of 6H-SiC. This similarity suggests that the stacking faults formation could be caused by the relaxation of the lattice-mismatch strain.

Abstract: In this work we present the growth of 4H-SiC crystals (2 inch in diameter) on the 8° off- axis C-face 6H-SiC seeds, inclined toward [11-20] direction. The growth of crystals by physical vapour transport method (PVT) was realized with the open seed backside in the experimental setup with graphite resistive heater. Some of the crystals were doped with cerium in the purpose of the 4H polytype growth stabilization. For Ce-doped crystals the seed backside carbonization process was decreased in comparison with such effect observed in the undoped SiC crystals.

Abstract: This article describes the analysis of the polytype transformation of SiC ingot. We analyzed the sample by Raman spectroscopy and TEM observation. The result of the analysis shows the polytype is transformed from 4H-SiC to 6H-SiC, and then returned to 4H-SiC. We found that the direction of the c-axis is not the same as the growth direction of the ingot. And also we found the existence of 8H-SiC at the interface between 6H-SiC and 4H-SiC region by the selected area diffraction pattern and confirmed it by HR-TEM observation.

Abstract: Bulk crystals of 6H and 4H silicon carbide have been grown by PVT method. 6H-SiC were obtained in optimized near-to-equilibrium growth conditions in order to improve the crystal quality and to provide the 6H seeds for 6H to 4H-SiC conversion. In experiments of 6H to 4H polytype transformation a set of invariable growth conditions was applied: C-face seed, C-rich atmosphere, on-axis seed orientation, pre-heating of the source material, slightly convex crystallization front and optimized geometry of the growth system. Other growth parameters were varied to optimize the polytype conversion, e.g.: structural quality of the seed, intentionally added impurity (N and/or Sc), initial growth stage recipe, argon pressure and temperature gradient - resulting in variety of growth rates and temperatures of the seed. Special attention was paid to seed passivation and a scheme of temperature and inert gas pressure changes during growth. Crystals were characterized by KOH etching, X-ray diffraction, optical and AFM microscopy. A reproducible method of 75% efficient conversion was elaborated. A large central surface free of micropipes was observed with characteristic six symmetrical ridges as well as the increased concentration of nitrogen. The parasitic 15R-SiC polytype was nucleated on the vicinal part of the crystallization front of 6H-SiC and 4H-SiC crystals.