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Articles by keyword: «TXRF»

• A New Powder Filler, Obtained by Applying a New Technology for Fly Ash Inertisation Procedure
  Published in: 12th INTERNATIONAL CERAMICS CONGRESS PART A (p27)
• A Novel Instrumentation for Contamination and Deposition Control on 300 mm Silicon Wafers Employing Synchrotron Radiation Based TXRF and EDXRF Analysis
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p89)
• Advanced TXRF Analysis: Background Reduction when Measuring High-k Materials and Mapping Metallic Contamination
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p285)
• Behaviour of Metallic Contaminants during Mos Processing
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p11)
• Investigation of Metallic Contamination Analysis Using Vapor Phase Decomposition – Droplet Collection – Total Reflection X-Ray Fluorescence (VPD-DC-TXRF) for Pt-Group Elements on Silicon Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p273)
• Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS
  Published in: Ultra Clean Processing of Silicon Surfaces V (p75)
• Mapping of Metallic Contamination Using TXRF
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p269)
• Novel Cleaning Method of SiC Wafer with Transition Metal Complex
  Published in: Silicon Carbide and Related Materials 2011 (p877)
• Preparation and Characterization of Self-Assembled Monolayers on Germanium Surfaces
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p169)
• Trace Metallic Contamination Analysis on Wafer Edge and Bevel by TXRF and VPD-TXRF
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p105)
• TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p165)
• X-Ray Spectrometry for Wafer Contamination Analysis and Speciation as Well as for Reference-Free Nanolayer Characterization
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p277)