Papers by Keyword: Titanium Nitride TiN

Abstract: When a surface of a titanium disk was melted in an atmosphere of pure nitrogen using a 3D Micro Welder which was designed by the present authors, the surface was nitrided to a depth of 90 to 260μm depending on the arc current of 6 to 24 A. The concentration of nitrogen in the nitrided layer was approximately 50 mol% at the surface, and the concentration decreased as the distance from the surface increased. A TiN layer was formed at the surface, and beneath the TiN layer, a dual phase layer of TiN and α-Ti was formed. Vickers hardness was approximately 1800 in the TiN layer and it varied from 900 to 200 in the dual phase layer as the distance from the surface increased.

Abstract: The uniform and dense structure of thin films is influenced by the texture of films. It was good to have uniform and dense structure and bad to have an open columnar structure in TiN thin films. Therefore, the property of diffusion barrier of the TiN films in semiconductor also is related to the texture and microstructure of TiN coated layers. In this study, the relationships between the textures and microstructures and the properties of TiN films on semiconductor were investigated under different processing methods (PVD and MOCVD). The property of diffusion barrier of RF sputtered (PVD) TiN is better than that of metal organic chemical vapor deposited (MOCVD) TiN thin films. Also the property of diffusion barrier of PVD (111) textured TiN is better than that of PVD (100) textured TiN thin films on oxidized Si wafer.

Abstract: In this paper, 3mol% yttria-stabilized tetragonal zirconia polycrystal (3Y-TZP) and TiN/3Y-TZP(adding TiN particles to 3Y-TZP) composites were fabricated by hot-pressing technique. Phase composition, microstructure and mechanical properties of the composites were investigated. It is shown that the flexural strength, fracture toughness and Vickers hardness of TiN/3Y-TZP was significantly improved by the addition of TiN particles compared with 3Y-TZP. The flexural strength of ZYT2 (20wt% TiN addition) is 1318 MPa. The fracture toughness of ZYT4 (40wt% TiN addition) is 16.8MPa·m1/2. The toughening and strengthening mechanisms were analyzed. The XRD results show that the additing of TiN can hinder the transformation from tetragonal phase to monoclinic phase of 3Y-TZP during fabrication process.

Abstract: Conditions favouring spontaneous growth of whiskers from tin coatings are discussed. Observations are reported concerning orientations and geometry of whiskers. The driving force for growth arises from elastic stress in the coating and can be expressed as a Gibbs free energy in terms of the decrease in pressure. An analysis of diffusion-controlled growth based on grain boundary diffusion seems to be capable of accounting for the fast growth kinetics that are observed in practice at room temperature.

Abstract: TiN coated films were prepared by a reactive ion physical vapor deposition method. In this research, we studied the relationships between textures and friction coefficient, erosion-corrosion resistance and corrosion resistance in textured TiN films. The surface roughness of (115) textured TiN films is lower than that of (111) textured TiN films. The friction coefficient of (115) textured surface is similar with that of (111) textured surface of TiN coated films. The erosion-corrosion and corrosion resistance of (115) textured surface is better than that of (111) textured surface of TiN coated films.