Papers by Keyword: e-Beam Deposition

Abstract: TiO2 thin films were deposited from Ti2¬O3, TiO2 and Ti3O5 source materials by e-beam. The refractive index and extinction coefficient of the films in the visible and near infrared（IR） region were measured. The structural and chemical properties of the films were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS). XRD measurements revealed that all the deposited films were amorphous. XPS analysis showed the films were stoichiometric TiO2. The AFM investigation confirmed that the surface roughness of the films was dependent on the deposition conditions.

Abstract: We show that it is possible to use high rate co-evaporation of Al and Si onto room temperature substrates to achieve a novel two-phase nanoscale microstructure. These nanocomposites have a hardness as high as 4GPa (Al-23at.%Si), and display noticeable plasticity. Films with compositions of Al-12at.%Si and pure Al (used as baseline) were analyzed using transmission electron microscopy (TEM). The scale of the Al-12at.%Si microstructure is an order of magnitude finer compared to that of pure Al films. It consists of a dense distribution of spherical nanoscale Si particles separating irregularly-shaped small Al grains. These new structures may have a mechanical performance advantage over conventional single phase nanomaterials due to the role of the dispersed hard phase in promoting strain hardening.