PVD-PECVD Hybrid Processes: Synthesis of Composite Thin Films and Process Understanding

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Abstract:

After reviewing most of the recent developments performed on hybrid processes, basic physical phenomena of PVD-PECVD processes are detailed with the help of a model showing the different influences of main process parameters. Ti-Si-O and Zn-Si-O thin films are synthesized as possible examples of composite thin films. Limitations of the model developed are also discussed with respect to the composition and structure of deposited thin films.

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Key Engineering Materials (Volumes 373-374)

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93-99

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March 2008

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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