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Particle-In-Cell Modelling of a Neutral Beam Source for Material Processing in Nanoscale Structures Fabrication

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Abstract:

Neutral beam processing has evolved into one of the most promising methods for overcoming plasma process induced damage. Surface treatment by neutrals avoids problems with surface charging effects, frequently encountered when using common ion treatment, especially for low k-materials. In this paper, the influence of various parameters on the neutralization of ion beams in Ar-CF4 mixture based on a Particle in Cell with Monte Carlo collisions (PIC/MCC) simulation is studied. The efficiency of neutralization has been treated by considering both surface neutralization of ions and collisions of ions in the gas.

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Periodical:

Materials Science Forum (Volume 555)

Pages:

47-52

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.555.47

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Online since:

September 2007

Authors:

M. Radmilović-Radjenović, Z.Lj. Petrović, Željka Nikitović, A. Strinić, V. Stojanović, Aleksandra Nina, B. Radjenović

Keywords:

Charging Damage, Etching, Material Processing, Nanoscale Structure, Neutralization Efficiency

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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