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Basic Self-Formation Processes in the Technologies of the Integrated Circuits

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Abstract:

The analysis for basic processes of self-formation microstructure in technologies of manufacturing semiconductor devices and integrated circuits (IC) have been made and the requirements have been formulated. The results of the implementation of self-formation processes for creating new technologies of manufacturing semiconductor devices and IC have been presented.

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Periodical:

Solid State Phenomena (Volumes 97-98)

Pages:

229-234

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.97-98.229

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Online since:

April 2004

Authors:

R. Navickas, R. Kirvaitis

Keywords:

Self-Formation Processes, Technologies of Integrated Circuits

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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References

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