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Advances in Crystal Growth

Materials Science Forum Volume 203

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• p85 Epitaxial Growth and Processing of InP Films in a 'Novel' Remote Plasma-MOCVD Apparatus   [ 303 K ]
  Authors: Giovanni Bruno, Maria Losurdo, P. Capezzuto, V. Capozzi, F.G. Lorusso, A. Minafra
• p91 InP Grown by Low-Pressure MOVPE Using Dimethylindium Pyrazole   [ 267 K ]
  Authors: G. Rossetto, G. Torzo, A. Camporese, P. Guerriero, M.L. Favaro, D. Ajò, P. Zanella
• p97 Growth and Characterization of High Efficiency GaAlAs/GaAs/Ge Solar Cells   [ 253 K ]
  Authors: G. Timò, C. Flores, R. Campesato, D. Passoni, B. Bollani
• p103 Growth and Characterization of InGaAsP/InGaAs MQW Structures Grown by MOCVD Technique   [ 200 K ]
  Authors: A. Antolini, G. Fornuto, C. Papuzza, D. Soldani, F. Taiariol
• p109 Growth and Realization of InGaAs/InP and InGaAs/InGaAsP Quantum Photonic Devices Grown by Chemical Beam Epitaxy   [ 295 K ]
  Authors: C. Rigo, C. Cacciatore, D. Campi, C. Coriasso, D. Soldani, A. Stano
• p115 MOCVD of CdTe on Foreign Substrates   [ 349 K ]
  Authors: S. Bernardi
• p123 Open Tube Iso-VPE of Hg_1-xCd_xTe on CdTe/Sapphire Hybrid Substrates   [ 295 K ]
  Authors: F. Campanella, S. Bernardi
• p129 The Influence of an Ultrathin Pseudomorphic Interface Control Layer of Si on the Growth of SrF₂ on GaAs   [ 283 K ]
  Authors: S. Heun, M. Sugiyama, S. Maeyama, Yu Watanabe, Keiji Wada, M. Oshima
• p137 Deposition of Doped and Undoped ZnO Thin Films fo Gas Sensors   [ 354 K ]
  Authors: M. Penza, C. Martucci, V.I. Anisimkin, L. Vasanelli
• p143 Influence of the Deposition Parameters on the Physical Properties of Tin Oxide Thin Films   [ 183 K ]
  Authors: M. Di Giulio, A. Serra, A. Tepore, R. Rella, P. Siciliano, L. Mirenghi
• p149 Growth of Thin Chalcopyrite CuInSe₂ Films by the Close Spaced Vapour Transport Process   [ 817 K ]
  Authors: M.L. Addonizio, S. Loreti, A. Agati, M. Pellegrino, L. Quercia, M.K. Jayaraj, A. Parretta
• p155 Deposition and Characterization of Nitroso-Compound LB Films   [ 156 K ]
  Authors: R. Rella, P. Siciliano, A. Tepore, L. Valli, G. Vasapollo
• p161 Dual Ion Beam Deposition and Characterizatio of TiO_x Thin Films   [ 237 K ]
  Authors: A. Rizzo, S. Cucurachi, L. Mirenghi, Silvia Scaglione, L. Vasanelli, E. Melissano
• p167 Growth of Si:H Thin Films by Hot Filament CVD: μ-Crystalline to Amorphous Transition   [ 266 K ]
  Authors: R. Polini, V. Barbarossa, C. Minarini, A. Eray, A. Marucci, G. Mattei
• p173 Triple Ion Beam Sputtering Deposition of β-FeSi₂   [ 377 K ]
  Authors: A. Valentini, E. Chimenti, A. Cola, G. Leo, F. Quaranta, L. Vasanelli