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Articles by author: C. Cowache

• Low Consumption Front End of the Line Cleaning: LC-FEOL
  Published in: Ultra Clean Processing of Silicon Surfaces V (p199)
• New Aspects of the Diluted Dynamic Clean Process
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p19)
• Post CMP Cleaning Using a Novel HF Compatible High Power Magasonic Tank
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p169)