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Papers by Author: E. Scheid

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Boron-Doped Polysilicon: Growth Kinetics and Structural Study of Low-Pressure Chemical Vapour Deposited Films in the Case of High Doping Levels

Authors: B. Caussat, E. Scheid, B. Legros-de Mauduit, R. Berjoan

Influence of Deposit Thickness on the Microstructure and Surface Roughness of Silicon Films Deposited from Silane

Authors: B. Caussat, J.P. Couderc, L. Vasquez, A. Figueras, A. Vander Lee, D. Cot, Jean Durand, V. Paillard, E. Scheid, B. Legros-de Mauduit, A. Vilà, J.R. Morante

125

Structural Studies of Annealing Effects on Semi-Insulating Polycrystalline Layers Obtained by Using Disilane

Authors: J.J. Pedroviejo, B. Garrido, J.R. Morante, E. Dehan, E. Scheid

155

Crystalline and Electrical Properties of Polysilicon Obtained by Annealing of Si Films Produced by Low Pressure Chemical Vapor Deposition from Si₂H₆

Authors: E. Campo, J.P. Guillemet, J.J. Pedroviejo, B. Legros-de Mauduit, E. Scheid

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