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Articles by author: E. Scheid

• Boron-Doped Polysilicon: Growth Kinetics and Structural Study of Low-Pressure Chemical Vapour Deposited Films in the Case of High Doping Levels
  Published in: Polycrystalline Semiconductors VI (p59)
• Crystalline and Electrical Properties of Polysilicon Obtained by Annealing of Si Films Produced by Low Pressure Chemical Vapor Deposition from Si₂H₆
  Published in: Polycrystalline Semiconductors III (p305)
• Influence of Deposit Thickness on the Microstructure and Surface Roughness of Silicon Films Deposited from Silane
  Published in: Polycrystalline Semiconductors V (p125)
• Structural Studies of Annealing Effects on Semi-Insulating Polycrystalline Layers Obtained by Using Disilane
  Published in: Polycrystalline Semiconductors IV (p155)