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Articles by author: F. Guyader

• Backside Cleaning for Copper Removal
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p121)
• Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence
  Published in: Ultra Clean Processing of Silicon Surfaces V (p27)
• n-Type Polydrystalline Silicon for Luminescent Porous Silicon Films
  Published in: Polycrystalline Semiconductors IV (p211)
• 'Resist / Wet Etch' Couple for Dual Gate Oxide
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p235)