Authors: S.H. Shim, Hyoun Woo Kim, C. Lee, D.J. Chung, S.G. Park, S.G. Lee, B.H. O, J. Kim, S.P. Chang, S.H. Lee
Abstract: We have obtained one-dimensional (1D) nanomaterials of tin oxide (SnO2) on silicon
nitride (Si3N4)-coated Si substrates by carrying out the thermal evaporation of solid Sn powders and
varying the substrate temperature in an Ar/O2 ambient gas. We analyzed the samples with scanning
electron microscopy, X-ray diffraction, transmission electron microscopy and photoluminescence
(PL). Reactions at a lower substrate temperature gave rise to thinner 1D structures. The obtained 1D
nanomaterials were single crystalline with a tetragonal rutile structure. We proposed a vapor-solid
process as the growth mechanism for SnO2 nanorods. The PL spectrum exhibited visible light
emission.
297
Authors: Jong Woo Lee, Hyoun Woo Kim, Jeong Whan Han, Mok Soon Kim, Byung Don Yoo, M.H. Kim, C.H. Lee, C.H. Lee, Cheol Ho Lim, Sun Keun Hwang, C. Lee, D.J. Chung, S.G. Park, S.G. Lee, B.H. O, J. Kim, S.P. Chang, S.H. Lee, Seung Yong Chai, Wan In Lee, S.E. Park, K. Kim, D.K. Choi, C.W. Chung
Abstract: We present a study of the photoresist (PR) etching and the low-k materials damage using a
ferrite-core inductively coupled plasma (ICP) etcher, in order to develop an etching process for the
low-k dielectric devices. We reveal that the N2/O2 flow ratio and bias power affected the PR etching
rate. By Fourier transform infrared spectroscopy and HF dipping test, we investigated the effect of the
gas flow ratio and bias power on the amount of etching damage to the low-k material.
113
Authors: Hyoun Woo Kim, Jong Woo Lee, Jeong Whan Han, Hyung Sun Kim, Mok Soon Kim, Byung Don Yoo, Sun Keun Hwang
Abstract: Indium oxide (In2O3) films were successfully grown on LiAlO2 substrates using the
triethylindium (TEI) as a precursor in the presence of oxygen in the metalorganic chemical vapor
deposition process. We have established the correlation between the substrate temperature and the
structural properties. The grain structures were clearly shown on the surface of the films deposited at
350°C. The root mean square (RMS) surface roughness of the In2O3 films increased with increasing
the substrate temperature. A photoluminescence measurement at room temperature exhibited a
yellow-green emission band centered at 585 nm.
625
Authors: Hyoun Woo Kim, S.H. Shim, B.H. O, S.G. Lee, S.G. Park, El Hang Lee
Abstract: We have fabricated the iron oxide nanowires directly from iron foils through the simple
heating in N2 ambient. We have characterized the samples by means of scanning electron microscopy,
transmission electron microscopy, energy-dispersive X-ray (EDX) spectroscopy, and selected area
diffraction pattern. The EDX spectrum revealed that the nanowires contained elements of Fe and O.
The iron oxide nanowires were crystalline with diameters in the range of 30-200 nm. We have
discussed the possible growth mechanisms.
597
Authors: Hyoun Woo Kim, S.H. Shim, Hae Jin Hwang, Jae Hyun Shim, Nam Hee Cho, Mi Kyoung Park, Hyuck Mo Lee, Byung Tae Ahn, Hyeong Tag Jeon, Jong Wan Park, Jin Ho Ahn, Bo Young Hur
Abstract: This study reported the fabrication of tin oxide (SnO2) nanostructures on Co-coated Si
substrates by the thermal heating of Sn powders. The microstructures and morphologies of the
resultant nanostructures were studied by means of X-ray diffraction (XRD), transmission electron
microscopy (TEM), selected area electron diffraction (SAED), and scanning electron microscopy
(SEM). The product mainly comprised the tangled nanowires with average diameters in the range of
50-180 nm. The nanostructures were single-crystalline rutile structure of SnO2. The PL measurement
with the Gaussian fitting exhibited visible light emission bands centered at 576 nm and 638 nm,
respectively. We have discussed the possible growth mechanism of the nanostructures.
1289
Authors: Hyoun Woo Kim, Sun Keun Hwang, Won Seung Cho, Tae Gyung Ko, Seung Yong Choi, Wan In Lee, Sang Eon Park, Jung Hoon Joo, Dong Ik Kim, Seong Gyoon Kim, Byung Hak Choe, Seok Hong Min, Jae Ho Choi
Abstract: This paper reports the fabrication of indium oxide (In2O3) films using a triethylindium and
oxygen mixture. The deposition has been carried out on TiAlN substrates (200-350°C). We have
established the correlation between the substrate temperature and the structural properties. The films
deposited at 300-350°C were polycrystalline, whereas those deposited at 200°C was close to
amorphous. XRD analysis and SEM images indicated that the films grown at 350°C had grained
structures with the (222) preferred orientation. The room-temperature photoluminescence spectra of
the In2O3 films exhibited a visible light emission.
1597
Authors: Chong Mu Lee, Young Joon Cho, Ho Jin Kim, Wang Woo Lee, Hyoun Woo Kim, Chang Kwon Hwangbo, Jae Gab Lee
Abstract: Influence of nitrogen and oxygen annealing atmospheres on the carrier concentration,
carrier mobility, electrical resistivity and PL characteristics as well as the crystallinity of ZnO films
deposited on sapphire substrates by atomic layer deposition (ALD) were compared. X-ray
diffraction (XRD) and photoluminescence (PL) analyses, and Hall measurement were performed to
investigate the crystallinity, optical properties and electrical properties of the ZnO thin films,
respectively. The UV emission intensity for oxygen annealing is stronger than that for nitrogen
annealing in the case of annealing at 600°C, but the difference decreases with the Increase of
annealing temperature. The strongest UV emission is obtained by oxygen annealing at 800°C.
However, from the viewpoint of electrical resistivity annealing at 1,000°C in either an oxygen or a
nitrogen atmosphere is more desirable. Taking both the PL and electrical properties into
consideration it may be concluded that optimum annealing condition for ZnO thin films grown on
the sapphire substrate by ALD is an annealing temperature of 900°C and an annealing atmosphere
of oxygen although the effects of annealing atmosphere on the optical and electrical properties are
not so significant.
729
Authors: Hyoun Woo Kim, S.H. Shim
Abstract: Branched SnO2 nanowires were prepared by heating Sn powders. SEM images indicated that
the single branched nanowires had diameters in the range 50-300 nm. XRD and SAED analysis revealed
that the SnO2 nanowires were crystalline with tetragonal rutile structure. PL spectrum showed visible
light emission.
2160
Authors: Hyoun Woo Kim, Ju Hyun Myung
Abstract: Indium oxide (In2O3) films was deposited on TiN substrates by the metal organic chemical
vapor deposition technique using a triethylindium and oxygen mixture. The films deposited at 250-350°C
were polycrystalline, while that deposited at 200°C was close to amorphous. XRD and SEM analyses
indicated that the films grown at 350°C had grained structures with the (222) preferred orientation.
760
Authors: Hyoun Woo Kim, Ju Hyun Myung
Abstract: We have prepared the gallium oxide (Ga2O3) films on sapphire substrates by a thermal
evaporation of GaN powders. We have characterized the films by using the x-ray diffraction (XRD),
scanning electron microscopy (SEM), and the photoluminescence (PL). SEM and XRD revealed that the
deposits were Ga2O3 thin films with monoclinic structure. PL spectrum of Ga2O3 films under excitation at
325 nm showed a blue emission.
637