Papers by Author: Kazuhiro Fujikawa

Abstract: 400V/2.5A 4H-SiC JFETs having a reduced surface field (RESURF) structure were fabricated. Measurements on the on-resistance, blocking and switching characteristics at high temperature were carried out. It was confirmed that the JFET has smaller dependence of on-resistance on temperature than a Si-MOSFET and positive temperature dependence of the breakdown voltage. It was also confirmed that the JFET has fast switching characteristics, that is, the turn-on and turn-off times are about 15 ns and 10 ns, at 200 °C as well as at 25 °C. A demonstration of a DC-DC converter using a module consisting of the JFET was carried out at a junction temperature of 200 °C. Stable continuous switching operation of the JFET at a junction temperature of 200 °C was confirmed.

Abstract: 400V/2.5A 4H-SiC JFETs having a reduced surface field (RESURF) structure were fabricated. Measurements on the static and switching characteristics were carried out. The on-resistance was 0.86 W. The turn-on time (ton) and the turn-off time (toff) were 8ns and 10 ns, respectively. The fabricated JFETs showed low on-resistance and fast switching characteristics. 4H-SiC RESURF-type JFETs, which is a sort of lateral transistor, are preferable to a module configuration of switching devices. Moreover, they are promising for application to DC power supplies with higher efficiency and smaller size owing to their low on-resistance and fast switching characteristics.

Abstract: We fabricated a multi-chip module of 4H-SiC reduced surface field (RESURF)-type lateral JFETs. A single chip consists of 4 unit devices of 2.0 mm × 0.5 mm in size, which were isolated electrically from each other. The multi-chip module consists of 8 chips mounted on an AMC substrate. The drain current and the breakdown voltage of the module are over 3 A and 771 V, respectively. The turn-on time and the turn-off time are 36ns and 166ns, respectively. The module resistance is proportional to the absolute temperature to the 1.05th power.

Abstract: We fabricated 4H-SiC lateral JFETs with a reduced surface field (RESURF) structure, which can prevent the concentration of electric field at the edge of the gate metal [1]. Previously, we reported on the 4H-SiC RESURF JFET with a gate length (LG) of 10 μm [2]. Its specific on-resistance was 50 mΩcm2, which was still high. Therefore, a Ti/W layer was used as an ion implantation mask so as to decrease the thickness of the mask and to improve an accuracy of the device process. A RESURF JFET with the gate length (LG) of 3.0 μm was fabricated, and the specific on-resistance of 6.3 mΩcm2 was obtained. In this paper, the fabrication process and the electrical characteristics of the device are described.