Papers by Author: Soo Jung Hwang

Abstract: Hillocks were observed in various thick Al films after annealing for a long time and their density and diameter were measured using an image analysis program. The hillock density decreased while the diameter increased with increasing film thickness. The total hillock volume per unit area of the film is linearly proportional to the film thickness and annealing temperature. Based on the results of our investigation, the effect of the film thickness, grain size and annealing temperature on hillock formation is discussed, and an equation that can be used to predict the hillock density and average hillock diameter is suggested.

Abstract: The reaction induced phase separation aimed for the distribution of nano-structured particles has been investigated by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS) in ternary Ti-Si-N film via N+ implantation. The fabrication of Ti-20at%Si film has made on Si substrates by ion beam sputtering (IBS), and then N+ implantation with 50 keV has been conducted on these films. The selected area electron diffraction (SAED) from as-deposited film shows amorphous Ti-Si. As-deposited Ti-Si film exhibited high stability even for the heat treatment at 773K for 3600s. N+ implantation induced the direct formation of nano crystalline of fcc-TiNx within the Ti-Si film. The XPS depth profiling and chemical shift suggest that the preferential nitriding of Ti accompanied with the segregation of SiNx occurred during N-implantation.