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Articles by author: Srini Raghavan

• Behaviors of Metallic Contaminants in Si Wafer Processing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p123)
• Contamination and Cleaning of Oxide Areas Exposed During Copper CMP in Hydroxylamine Based Slurries
  Published in: Ultra Clean Processing of Silicon Surfaces V (p295)
• Corrosion Inhibaitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p271)
• Dissolution Characteristics of Ceria in Ascorbic Acid Solutions with Implications to Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p283)
• Effect of Surface Charge and Fluid Properties on Particle Removal Characteristics of a Surface-Optimized REB Filter
  Published in: Ultra Clean Processing of Silicon Surfaces V (p271)
• Electrochemical Impedance Spectroscopic Characterization of Hydrophobic Coatings Deposited onto Pre-Oxidized Silicon
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p211)
• Wettability Modification of Polysilicon for Stiction Reduction in Silicon Based Micro-electromechanical Structures
  Published in: Ultra Clean Processing of Silicon Surfaces V (p23)