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Articles by keyword: «Etch Rate»

• Advances in Test Wafer Reclaim Technology – Wet Stripping Porous Low-k Films with No Substrate Damage
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p339)
• Chemical Additive Formulations for Particle Removal in SCCO₂-Based Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p193)
• Cleaning and Surface Preparation for SiGe and Ge Channel Device
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p19)
• Determination of SC1 Etch Rates at Low Temperatures with Microscope Interferometry
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p275)
• Effect of Wet Treatment on Stability of Spin-On Dielectrics for STI Gap-Filling in Nanoscale Memory
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p193)
• Etch Rate Study of Germanium, GaAs and InGaAs: A Challenge in Semiconductor Processing
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p203)
• Fast and Anisotropic Reactive Ion Etching of 4H and 6H SiC in NF₃
  Published in: Silicon Carbide, III-Nitrides and Related Materials (p829)
• In Situ Wafer Processing for Next Generation Devices
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p45)
• Metal Wet Cleaning with No Corrosion: A Novel Approach
  Published in: Ultra Clean Processing of Silicon Surfaces V (p35)
• Piezoelectric Properties of Sputtered AlN Thin Films and their Applications
  Published in: Smart Materials & Micro/Nanosystems (p41)
• Reactive Ion Etching of Silicon Carbide with Patterned Boron Implantation
  Published in: Silicon Carbide and Related Materials 2003 (p925)