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Articles by keyword: «Ni-Silicide»

• A Model for Formation and Consumption of Transient Phase
  Published in: Solid-Solid Phase Transformations in Inorganic Materials (p646)
• AEM Study on the Phase Transformation of Nickel Silicides in the Ni_1-xTa_x/Si System
  Published in: Advances in Nanomaterials and Processing (p45)
• Backside Nickel Based Ohmic Contacts to n-Type Silicon Carbide
  Published in: Silicon Carbide and Related Materials 2007 (p635)
• In-Situ Investigation of Carbon Reduction at Ni/4H-SiC Interface Using a Silicon Interlayer
  Published in: Silicon Carbide and Related Materials 2003 (p849)
• RTP Requirements for CMOS Integration of Dual Work Function Phase Controlled Ni-FUSI (Fully Silicided) Gates with Simultaneous Silicidation of nMOS (NiSi) and pMOS (Ni-Rich Silicide) Gates on HfSiON
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p341)
• The Formation Mechanism of Ni-Based Ohmic Contacts to 4H-n-SiC
  Published in: Silicon Carbide and Related Materials 2011 (p833)
• Theoretical and Experimental Evidences of Sequential Phase Formation during Sub-Nanometric-Thick Film Reactive Diffusion
  Published in: Solid-Solid Phase Transformations in Inorganic Materials (p633)
• Toward a Better Understanding of Ni-Based Ohmic Contacts on SiC
  Published in: Silicon Carbide and Related Materials 2010 (p465)