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Articles by keyword: «Plasma Damage»

• Effects of Bias, Pressure and Temperature in Plasma Damage of Ultra Low-k Films
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p317)
• Impact of RF Oxygen Plasma on Thermal Oxide Etch-Rate
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p125)
• Mechanism of Plasma-Less Gaseous Etching Process for Damaged Oxides from the Ion Implantation Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p227)
• Porous Low-k Wet Etch in HF-Based Solutions: Focus on Cleaning Process Window, "Pore-Sealing" and "k Recovery"
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p295)