Articles by keyword: «Plasma Nitridation»
5 papers on 1 page:
1
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Advanced Gate Dielectric Development for VLSI Technology
Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p133) -
Dependency of 1/f Noise on Initial Oxidation Method in Nano-CMOS Technology
Published in: Nanoscience and Technology (p595) -
Impact of a Treatment Combining Nitrogen Plasma Exposure and Forming Gas Annealing on Defect Passivation of SiO2/SiC Interfaces
Published in: Silicon Carbide and Related Materials 2008 (p525) -
Improved Electrical Properties and Thermal Stability of GeON Gate Dielectrics Formed by Plasma Nitridation of Ultrathin Oxides on Ge(100)
Published in: Technology Evolution for Silicon Nano-Electronics (p152) -
Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm
Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p153)