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Articles by keyword: «Silicon Oxide (SiO)»

• A Silicon Oxide Hard Coating Deposited on Flexible Substrate by TMS - PECVD System
  Published in: Progress on Advanced Manufacture for Micro/Nano Technology 2005 (p439)
• Accumulation of Hydrogen within Implantation-Damaged Areas in Processed Si:N and Si:O
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIII (p319)
• Atmospheric Pressure Plasma-Enhanced CVD for Surface Modification: Principles and Applications
  Published in: 11th International Ceramics Congress (p1173)
• Buried SiO₂ Films: Interfaces and Defects
  Published in: Defects in Insulating Materials (p1)
• Cathodoluminescence of SiO₂/Si System
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIII (p487)
• Characterization of Oblique Deposited Nanostructured SiO_x Films by Ellipsometric and IR Spectroscopies
  Published in: Nanostructured Materials, Thin Films and Hard Coatings for Advanced Applications (p149)
• Complex Diffusive Processes in Silicon
  Published in: Diffusion in Materials DIMAT 1996 (p971)
• Corrosion of Si-Based Non-Oxide Ceramics by Molten Na₂SO₄
  Published in: Euro Ceramics V (p1588)
• Defect Engineering in the Development of Advanced Silicon Crystals and Wafers
  Published in: Gettering and Defect Engineering in Semiconductor Technology VIII (p111)
• Defects in As-Prepared and Thermally Oxydized Porous Silicon
  Published in: Defects in Semiconductors 17 (p1487)
• Electronic and Atomic Structure of an Ordered Silicate Adlayer on Hexagonal SiC
  Published in: Silicon Carbide and Related Materials - 1999 (p387)
• Energy Loss of O1s Photoelectrons in Compositional and Structural Transition Layer at and near the SiO₂/Si Interface
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p241)
• Experimental Study and Thermodynamic Calculations of the MgO-Y₂O₃-SiO₂ System
  Published in: Silicon Nitride '93 (p399)
• Improvement of Luminescent Properties of Phosphor Powders Coated with Nanoscaled SiO₂ by Atomic Layer Deposition
  Published in: Advances in Nanomaterials and Processing (p375)
• Novel Low-K Dielectric Obtained by Xenon Implantation in SiO₂
  Published in: Gettering and Defect Engineering in Semiconductor Technology XI (p291)