Synthesis and Characterization of TiO2 Thin Film by Self-Assembly Method

Wen Ning Mu; Shuang Zhi Shi

doi:10.4028/www.scientific.net/AMM.148-149.1500

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 148-149Synthesis and Characterization of TiO2 Thin Film...

Synthesis and Characterization of TiO₂ Thin Film by Self-Assembly Method

Abstract:

TiO₂ thin films were deposited on SAM-coated silicon substrate by layer-by-layer self-assembly method. The influence of various parameters was investigated to optimize the conditions and the results show that with increasing deposition temperature and deposition time, and decreasing molar ratio of HCl to TiO22+, the content of TiO22+ in the reaction solution decreases. The as-deposited thin films were fully amorphous from the result of XRD, also were homogeneous and continuous produced at 80 °C for120 min as presented in SEM images, and the average size of particles on the thin film surface is approximately 33 nm.

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Applied Mechanics and Materials (Volumes 148-149)

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1500-1503

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https://doi.org/10.4028/www.scientific.net/AMM.148-149.1500

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December 2011

Authors:

Wen Ning Mu, Shuang Zhi Shi

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Layer-by-Layer Deposition, Self-Assembly Method, Thin Film, TiO₂

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