Micro-Deposition of the Film Material Using Femtosecond Laser Pulse

Yang Li; Ping Ping Sun; Ai Qing Wu

doi:10.4028/www.scientific.net/AMM.229-231.109

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 229-231Micro-Deposition of the Film Material Using...

Micro-Deposition of the Film Material Using Femtosecond Laser Pulse

Abstract:

The femtosecond laser-induced forward transfer of the aluminum film had been studied experimentally by single-shot laser pulse (pulse duration 148fs, central wavelength 775nm). With the help of the atomic force microscope and scanning electron microscope, the dependence of morphology and dimension of deposited dots on irradiated laser pulse energy were investigated. It was revealed the threshold fluence for transfer was ~6.3 J/cm2 for the aluminum thin film with a thickness of ~500 nm. It also was presented the micro patterns of the aluminum film on a quartz substrate fabricated using the femtosecond laser-induced forward transfer .

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Periodical:

Applied Mechanics and Materials (Volumes 229-231)

Pages:

109-112

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https://doi.org/10.4028/www.scientific.net/AMM.229-231.109

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Online since:

November 2012

Authors:

Yang Li, Ping Ping Sun, Ai Qing Wu

Keywords:

Femotosecond Laser, Laser-Induced Forward Transfer, Micro Patterns, Thin Film

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