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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 263-266Numerical Simulation and Optimization of 3µm...

Numerical Simulation and Optimization of 3µm Emission in Er: YLF Crystals by Means of Simulated Annealing Technique

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Abstract:

In this work a multi-objective Simulated Annealing algorithm (SA) is applied to maximize the small signal gain (SSG) of Er3+-3µm: YLF crystal, which plays important role in the laser systems development (and further operation). For this purpose the rate equations Er:YLF crystal were solved numerically and 3 microns SSG for different Er3+ concentrations was maximized by Simulated annealing (SA) technique taken into account the pulse time (time-ON), time-OFF and the pumping rate (Rp) parameters. Results show that is possible to obtain valid laser gain for erbium concentration smaller than 9 mol % for the Er:YLF system after appropriate set of these parameters.

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Periodical:

Applied Mechanics and Materials (Volumes 263-266)

Pages:

2217-2220

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.263-266.2217

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Online since:

December 2012

Authors:

Wonder Alexandre Luz Alves*, Nélito Bernardes Pereira Junior, André Felipe Henriques Librantz, Sidnei Alves De Araújo

Keywords:

3 Microns Laser Emission, Erbium YLF System, Optimization, Simulated Annealing Technique

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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